脉冲激光沉积法制备ZnO薄膜的研究进展
Electronic Components and Materials(2006)
Abstract
基于氧化锌薄膜紫外光发光的实现,ZnO薄膜成为新的研究热点。综述了各种沉积条件对脉冲激光沉积(PLD)技术生长的氧化锌薄膜的微结构、光学和电学性质的影响,ZnO薄膜的厚度在超过400 nm时,呈现出了近似块状的性质。采用PLD技术,可以在适当的条件下制备具有特定功能的氧化锌薄膜。
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Key words
ZnO thin film,oxygen pressure,substrate temperature,semiconductor technology,PLD,review
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