Profilometer of secondary beams based on a multiwire proportional chamber

A profilometer for diagnostics of secondary ion beams with Z ≥ 2 is described. Two methods of beam profile measurements are compared: a counting method, when pulses from each particle are registered, and a current method with channel-by-channel measurement of the integral current. The counting characteristics and the lifetimes of the profilometer for these methods of beam profile measurements are compared.