Shape control of polymer reflow structures fabricated by nanoimprint lithography

Microelectronic Engineering(2011)

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摘要
Nanoimprinted resist pre-forms were modified using thermal reflow. This post-processing of binary structures enabled us to generate lens-like 3-D structures with different shapes by time- and surface chemistry controlled spreading. The method was extended to feature dimensions down to 100nm. Surfactant coated line nanostructures were found to be limited by a maximum aspect ratio for imprinted pre-forms. This powerful post-processing method can be used either directly as post-processing step in production or for the fabrication of 3-D stamp copies with the desired shapes.
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关键词
nanoimprint lithography,powerful post-processing method,lenses,shape control,post-processing step,3-d stamp copy,surfactant coated line nanostructures,surface chemistry,different shape,imprinted pre-forms,dewetting,maximum aspect ratio,binary structure,contact angle,stamps,polymer reflow structure,lens-like 3-d structure,reflow,aspect ratio
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