Feasibility Study Of Tft-Lcd Array Tester Using Low Voltage Micro-Columns

Since Chang et al. reported the pioneering concept of micro-column, researches on the micro-column have been devoted to its application to low energy electron beam lithography with high throughput capabilities using arrayed micro-column structure [E. Kratschmer, H.S. Kim, M.G.R. Thomson, K.Y. Lee, S.A. Rishton, M.L. Yu, S. Zolgharnain, B.W. Hussey, T.H.P. Chang, J. Vac. Sci. Technol. B 14(6) (1996) 3792; T.H.P. Chang, M.G.R. Thomson, E. Kratschmer, H.S. Kim, M.L. Yu, K.Y. Lee, S.A. Rishton, B.W. Hussey, S. Zolgharnian, J. Vac. Sci. Technol. B 18(6) (1996) 3774; L.P. Muray, J.P. Spallas, C. Stebler, K. Lee, M. Mankos, Y. Hsu, M. Gmur, T.H.H. Chang, J. Vac. Sci. Technol. B 18(6) (2000) 3099; H.S. Kim, D.W. Kim, S. Ahn, Y.C. Kim, J. Cho, S.K. Choi, D.Y. Kim, Microclectron. Eng. 55 (2005) 78-79]. Also, developing inspection systems using micro-columns can be a promising technology for the production of next generation devices with narrow line-width since the low energy (<1 keV) beam can minimize the damage of devices. In this experiment, we have assembled a TFT-LCD array tester with a micro-column and tested its performance as a feasibility study. (C) 2007 Elsevier B.V. All rights reserved.