Bias-stress-induced evolution of the dielectric properties of porous-ULK/ copper advanced interconnects
MICROELECTRONIC ENGINEERING(2005)
摘要
The dielectric properties of porous ULK/Cu interconnects designed for sub 65nm nodes are degraded at high bias-stress. The resulting increase of dielectric constant and defect density can be estimated from the Poole-Frenkel modeling of the leakage currents above 1MV/cm. More generally, the porous SiCOH dielectric materials showing this transport mechanism appear to be inherently less reliable when their initial k value is the lowest. This trend is obviously a major issue for further downscaling developments of porous ULK/Cu interconnects.
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关键词
porous,ULK,transport,conduction,Poole-Frenkel,reliability,SiCOH,dielectric,defect
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