Nanoimprint lithography for a large area pattern replication
Microelectronic Engineering（1999）
Abstract
We report on replication of high resolution patterns over a 4 in. wafer area by imprint lithography with a commercial hydraulic press and a pair of hot plates. The experiments confirm that the imprint lithography can be used for large area patterning. As a result, sub-100 nm features were obtained by the imprint lithography and lift-off with a good uniformity and an accurate pattern placement over the 4 in. wafer area.
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Key words
imprint lithography,large area pattern replication,good uniformity,wafer area,hot plate,commercial hydraulic press,accurate pattern placement,nanoimprint lithography,sub-100 nm feature,large area patterning,high resolution pattern
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