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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 10 篇作者统计合作学者相似作者

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High-NA benefit assessment through Zeiss AIMS EUV for tip-to-tip patterning by EUVL
Rik M. Jonckheere,Tatiana Kovalevich,Vincent J. Wiaux,Vicky Philipsen,Eric Hendrickx, Andreas Verch, Maximillian Albert, Renzo Capelli
Optical and EUV Nanolithography XXXVII (2024)
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An experimental stitching study on the eve of high-NA EUV
Vincent J. Wiaux,Natalia Davydova,Lieve Van Look, Nick Pellens, Ataklti Weldeslassie, Guillaume Libeert,Tatiana Kovalevich, Frank Timmermans, Laura Huddleston
Optical and EUV Nanolithography XXXVII (2024)
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A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation
Stewart Robertson, Robert Schramm,Alessandro Vaglio Pret,Vincent Wiaux
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
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Resist and reticle activities towards High-NA EUV ecosystem readiness
Jara Santaclara, Weimin Gao,Eric Hendrickx,Vincent Wiaux,Joern-Holger Franke,Emily Gallagher, Kannan Keizer,Tatiana Kovalevich, Jo Finders
Optical and EUV Nanolithography XXXV (2022)
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Stitching for High NA: new insights and path forward
Natalia V. Davydova,Vincent Wiaux, Joost Bekaert,Frank J. Timmermans, Bram Slachter,Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp,Rongkuo Zhao, Dezheng Sun,Ming-Chun Tien,
International Conference on Extreme Ultraviolet Lithography 2022 (2022)
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Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications
Vincent Wiaux,Joost Bekaert,Tatiana Kovalevich,Julien Ryckaert,Eric Hendrickx,Natalia Davydova, Pieter Woltgens,Ming-Chun Tien, Laurens de Winter, Mark John Maslow, Kars Zeger Troost
Extreme Ultraviolet Lithography 2020 (2020): 76-83
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Mask 3D effects experimental measurements with NA 0.55 anamorphic imaging (Conference Presentation)
Vincent Wiaux,Vicky Philipsen,Eric Hendrickx
International Conference on Extreme Ultraviolet Lithography 2018 (2018): 1080913
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