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Research Interests

Papers共 51 篇Author StatisticsCo-AuthorSimilar Experts

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Rigorous 3D Probabilistic Computational Lithography and Chip-Level Inspection for EUV Stochastic Failure Detection
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang,Changmin Park, Kyoil Koo, Seongtae Jeong,
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
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Comprehensive Extreme Ultraviolet Blank Defect Avoidance System
Brandon Hurt,Ryan Carlson,Yao Zhang, Xiaochun Yang,Masaki Satake, Yifu Wang,Derui Li,Vikram Tolani,Daniel Price
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2022 (2022)
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0
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The application of reticle analyzer in DRAM fab
Asei Chou, Wenhao Hsu, Andy Lan, Jason Fang, Claire Lu, Harper Yu, Zeyu Lei, Catherine Li, Yanghui Liu,Vikram Tolani
Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology (2021)
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Need for Comprehensive Reticle Data Management and Analytics
Daniel Price, Brandon Hurt,Ryan Carlson, Ryan Gardner,Yao Zhang,Masaki Satake,Derui Li, Will Wang, Wallace Wang, Peter Liu,George Hwa,Vikram Tolani
PHOTOMASK TECHNOLOGY 2020 (2020)
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Classification And Printability Of Euv Mask Defects From Sem Images
Wonil Cho,Daniel Price,Paul A. Morgan, Daniel Rost,Masaki Satake,Vikram L. Tolani
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017 (2017)
Cited2Views0Bibtex
2
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Reticle Decision Center - A Novel Applications Platform For Enhancing Reticle Yield And Productivity At 10nm Technology And Beyond
George Hwa, Raj Bugata,Kaiming Chiang,Suresh Lakkapragada,Vikram Tolani, Sandhya Gopalakrishnan, Chun-Jen Chen, Chin-Ting Yang, Sheng-Chang Hsu,Laurent Tuo
PHOTOMASK TECHNOLOGY 2016 (2016)
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Author Statistics

#Papers: 50

#Citation: 377

H-Index: 12

G-Index: 17

Sociability: 5

Diversity: 1

Activity: 0

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