Takahiro Shiozawa - Tokyo Electron Kyushu Ltd

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论文共 12 篇作者统计合作学者相似作者

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Novel technologies in coater/developer to improve the defectivity for advanced EUV patterning materials

Yuya Kamei, Tomoya Onitsuka,Takashi Yamauchi,Takahiro Shiozawa, Yuhei Kuwahara, Shinichiro Kawakami,Seiji Fujimoto,Arisa Hara,Satoru Shimura

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX (2022)

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EUV defect reduction activities using coater/developer and etching technique

Takahiro Shiozawa,Keisuke Yoshida, Noriaki Nagamine,Arnaud Dauendorffer,Satoru Shimura,Kathleen Nafus, Yannick Feurprier,Kenta Ono,Shota Yoshimura, Atsutoshi Inokuchi, Kiyoshi Maeda,Tetsuya Nishizuka,

Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series (2021): 180-186

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Addressing EUV patterning challenges towards the limits of NA 0.33 EUV exposure

Arnaud Dauendorffer, Onitsuka Tomoya, Hiroki Tadatomo,Keisuke Yoshida,Takahiro Shiozawa, Genjima Hisashi, Noriaki Nagamine,Yuya Kamei,Soichiro Okada, Shinichiro Kawakami,Makoto Muramatsu,Satoru Shimura,

International Conference on Extreme Ultraviolet Lithography 2021 (2021)

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Consideration Of Missing Defect Suppression Technique In Euv Hole Patterning

Takahiro Shiozawa,Arisa Hara,Satoru Shimura,Hidetami Yaegashi

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXVII (2020)

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Clean Track (Tm) Solutions For Defectivity And Cd Control Towards 5 Nm And Smaller Nodes

Arnaud Dauendorffer,Takahiro Shiozawa,Keisuke Yoshida, Noriaki Nagamine,Yuya Kamei, Shinichiro Kawakami,Satoru Shimura,Kathleen Nafus,Akihiro Sonoda,Philippe Foubert

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI (2020): 512-523

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Improvement of EUV processes for high volume manufacturing

Makoto Muramatsu, Hiroki Tadatomo, Onitsuka Tomoya,Keisuke Yoshida,Arnaud Dauendorffer,Takahiro Shiozawa,Soichiro Okada, Shinichiro Kawakami,Satoru Shimura

Extreme Ultraviolet Lithography 2020 (2020)

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The defect mitigation on EUV stack by track based technology

Naoki Shibata,Lior Huli, Corey Lemley, Yuichiro Miyata,Dave Hetzer, Toshiharu Wada, Ko Akiteru,Shinichiro Kawakami, Akiko Kai,Takahiro Shiozawa, Hidetsugu Yano,Kenichi Ueda,

Proceedings of SPIE（2019）

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Resist coating and developing process technology toward EUV manufacturing sub 7nm node

Yuya Kamei,Takahiro Shiozawa,Shinichiro Kawakami,Hideo Shite,Hiroshi Ichinomiya,Yusaku Hashimoto,Masashi Enomoto,Kathleen Nafus,Akihiko Sonoda,Marc Demand,Philippe Foubert

2018 International Symposium on Semiconductor Manufacturing (ISSM)（2018）

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EUV resist sensitization and roughness improvement by PSCAR (TM) with in-line UV flood exposure system

Seiji Nagahara, Michael Carcasi,Gosuke Shiraishi,Yuya Kamei,Kathleen Nafus,Yukie Minekawa,Hiroyuki Ide,Yoshihiro Kondo,Takahiro Shiozawa,Keisuke Yoshida, Masashi Enomoto,Kosuke Yoshihara,

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXV (2018): 6-16

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Resist coating and developing process technology toward EUV manufacturing sub-7nm node

Yuya Kamei,Takahiro Shiozawa,Shinichiro Kawakami,Hideo Shite,Hiroshi Ichinomiya,Yusaku Hashimoto,Masashi Enomoto,Kathleen Nafus,Akihiko Sonoda,Marc Demand,Philippe Foubert

Proceedings of SPIE (2018)

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