检索
AI 对话
analysis
趋势分析
编组
开放平台
more
更多
排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
VIPCreated with Sketch.
研究兴趣

论文共 16 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Large Field of View Metrology: Detecting critical Edge Placement Error signatures not seen with small Field of View in an HVM environment
Mohamed Ridane, Ivy Chen, Jaden Song, Peter Nikolsky, Kuan-Ming Chen, Shinyeong Lee, Sean Park, Kolos Lin, Yu-Chi Su, Kyoyeon Cho, Ethan Yu, James Park,
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
引用0浏览0引用
0
0
Budgeting and predicting pattern defects using edge placement error and machine learning
Taekwon Jee, Joonsang You, Hong-Goo Lee,Sang-Ho Lee,Seungmo Hong, Jaewook Seo, Roi Meir, Noam Oved, Jun Park, Shin-Ik Kim, Byung-Jo Lim, Chan-Hee Kwak,
2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTMpp.1-4, (2023)
引用0浏览0EIWOS引用
0
0
Evaluation of robust EPE monitoring and control metric methodologies for advanced DRAM nodes yield improvement
Yaniv Abramovitz, Jeong-Ho Yeo,Taekwon Jee, Honggoo Lee, Sangho Lee, Chanha Park
Metrology, Inspection, and Process Control XXXVI (2022)
引用0浏览0引用
0
0
Edge placement error wafer mapping and investigation for improvement in advanced DRAM node
Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 453-463
引用2浏览0引用
2
0
EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment
Hidetami Yaegashi, Kyohei Koike,Carlos Fonseca, Fumiko Yamashita,Kumar Kaushik, Shinya Morikita, Kiyohito Ito, Shota Yoshimura,Vadim Timoshkov,Mark Maslow,Tae Kwon Jee, Liesbeth Reijnen,
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXV (2018)
引用1浏览0引用
1
0
Euv Local Cdu Healing Performance And Modeling Capability Towards 5nm Node
Tae Kwon Jee,Vadim Timoshkov,Peter Choi,David Rio, Yu-Cheng Tsai,Hidetami Yaegashi, Kyohei Koike,Carlos Fonseca,Stijn Schoofs
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017 (2017)
引用0浏览0引用
0
0
加载更多
作者统计
  • 合作者
  • 学生
  • 导师
暂无相似学者，你可以通过学者研究领域进行搜索筛选
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn