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Research Interests

Papers共 9 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Residuals Reduction in Imaging-Based Overlay using Color per Layer
Katz Shlomit,Suk Won Park, Joonsang You,Hyunjun Kim,Honggoo Lee,Jungchan Kim,Dongyoung Lee, Hongbok Yeon, Joonseuk Lee,Sang-Ho Lee, Jae Wook Seo, Yehuda Dor,
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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A Study of High Voltage NMOSFET degradation for NAND HVSW circuit
Young Gon Lee,Sang Ho Lee,Sung Kye Park
2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)pp.1-3, (2023)
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A Study of the non-Weibull distribution of HK PMOS TDDB
Jeong-hwan Hwang, Yong Gon Lee,Sang Ho Lee,Sung Kye Park
2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)pp.1-4, (2023)
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Budgeting and predicting pattern defects using edge placement error and machine learning
Taekwon Jee, Joonsang You, Hong-Goo Lee,Sang-Ho Lee,Seungmo Hong, Jaewook Seo, Roi Meir, Noam Oved, Jun Park, Shin-Ik Kim, Byung-Jo Lim,Chan-Hee Kwak,
2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTMpp.1-4, (2023)
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Overlay stability control in IBO measurement using rAIM (TM) target
Nahee Park,Dohwa Lee, Liu Liu,Xuefei Zhou,Hongpeng Su,DongSub Choi, Wayne Zhou, Hedvi Spielberg,Efi Megged,Chen Dror, Diana Shaphirov, Zephyr Liu,
Metrology, Inspection, and Process Control XXXVI (2022)
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Qualification Of Small Alignment Mark By On-Product Overlay Performance
Jigang Ma, Frans Bijnen, Edo Hulsebos,Lukasz Macht, Sotirios Tsiachris, Jin Dai, Rob Van Der Meulen, Miao Yu, Paul Bocker,Jung-Hwan Kim, Hyun Kim,Gwang-Gon Kim,
OPTICAL MICROLITHOGRAPHY XXXIV (2021)
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Statistical process optimization method for metrology equipment
Dongsoo Kim, Moran Zaberchik,Chen Li, Honggoo Lee,Chanha Park,Sang Ho Lee,Dongyoung Lee, Scott Beatty, Jae Young Park, Ramkumar Karur-Shanmugam, Telly Koffas,Dohwa Lee,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 488-494
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Author Statistics
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