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Bio
Throughout his career at IBM, Steve and his colleagues have expanded the capabilities of sputter deposition to meet the challenges of the ever-more demanding integrated circuit technology roadmap. The team, initially focused on magnetrons, pioneered developments related to gas rarefaction, plasma impedance, sputtered atom transport, and very low-pressure sputtering. From these areas came the inventions of hollow-cathode enhancement, collimated deposition, and ionized PVD; the latter two are now used broadly across the semiconductor manufacturing world. In later work, they developed plasma-enhanced atomic layer deposition for semiconductor applications with a primary focus on interconnect applications. Key research was done on the microstructure and interfaces of Cu and W features to control resistivity at and below the electron-scattering scale. Steve’s other investigations spanned a broad range of topics from novel semiconductor devices and nanopore-based DNA microfluidic devices, to the application of plasma-based deposition processes for quantum computing (qubit formation). In total, Steve’s innovations have led to numerous awards at IBM, while contributing to over 80 patents, as registered by USPTO.
Research Interests
Papers共 214 篇Author StatisticsCo-AuthorSimilar Experts
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ano. 6 (2020)
Handbook of Semiconductor Manufacturing Technologypp.15-1, (2017)
mag(2014)
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mag(2014)
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