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Research Interests

Papers共 3 篇Author StatisticsCo-AuthorSimilar Experts

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Maskless exposure of die annotations and image sensor patterns employing 7th generation RGB resists
Ksenija Varga, Martin Weinhart,Roman Holly,Tobias Zenger,Boris Povazay, Frank Bögelsack, Andreas Spitzer,Thomas Uhrmann, Hirotaka Takishita, Yoshinori Taguchi, Johannes Koch, Matthias Schicke
Novel Patterning Technologies 2024 (2024)
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Exploring Capabilities of Maskless Lithography for Dual- Image Exposure in FO WLP
Ksenija Varga,Thomas Uhrmann,Roman Holly,Tobias Zenger, Chris Milasinic,Mel Zussman, Ron Legario, Michae L. Knaus
2023 IEEE 73RD ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, ECTCpp.1143-1149, (2023)
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Optimization of PI & PBO Layers Lithography Process for High Density Fan-Out Wafer Level Packaging & Next Generation Heterogeneous Integration Applications Employing Digitally Driven Maskless Lithography
Thomas Uhrmann,Boris Povazay,Tobias Zenger, Bemd Thallner,Roman Holly, Bozena Matuskova Lednicka, Mario Reybrouck, Niels Van Herck, Bart Persijn, Dimitri Janssen, Stefan Vanclooster, Stef Heirbaut
IEEE 72ND ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC 2022)pp.1500-1504, (2022)
Cited2Views0EIWOSBibtex
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