Dr. Dammel is the author of over 200 scientific papers in chemistry and microlithography and an inventor on over 100 patent families in the field. His monograph “Diazonaphthoquinone-based Resists” is generally recognized as the definitive book on the subject. Dr. Dammel is an Associate Editor of the Journal of Micro/Nanolithography, Microfabrication, and Microsystems (JM3). In 2009, Dr.Dammel was elected to the position of Fellow by the International Society for Optical Engineering (SPIE). In 2011, Dr. Dammel received the Photopolymer Science and Technology Award of the Japanese Photopolymer Society, and in 2015, he won SPIE's Frits Zernike award. Specialties: General lithographic materials, photoresists, chemcial amplification, diazonaphthoquinones, antireflective coatings, shrink coatings, LWR reduction, FPD photoresists, optical overcoats, spin-on dielectrics, immersion lithography, Directed Self Assembly (DSA), novel carbon materials: CNTs, GNRs, graphene, GO, other 2D materials.