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My research involves developing methods for X-ray metrology for complex 3D nanostructures for the semiconductor industry. I also develop methods for using soft and hard x-ray scattering to characterize the pattern shape and local chemistry in next generation lithographies such as directed-self assembly of block copolymers and extreme ultraviolet lithography. A method developed by our group called critical dimension small angle X-ray scattering (CDSAXS) was recently transferred to the semiconductor industry and is being used in memory fabs for characterizing high aspect ratio memory structures such as 3D-NAND.
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Papers共 173 篇Author StatisticsCo-AuthorSimilar Experts
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JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 3 (2023)
ENERGY & ENVIRONMENTAL SCIENCEno. 3 (2023): 1234-1250
Zeinab Hamid,Andrew Wadsworth,Elham Rezasoltani,Sarah Holliday,Mohammed Azzouzi,Marios Neophytou, Anne A Y Guilbert, Yifan Dong, Mark S Little,Subhrangsu Mukherjee,Andrew A Herzing,Helen Bristow,
Advanced energy materialsno. 8 (2020)
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