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个人简介
I am a PhD Scholar affiliated to Homi Bhabaha National Institute, Department of Atomic energy, Govt. of India and currently working as a Senior research scholar at Oxide Nano Electronics Lab, RRCAT, Indore, India under the supervision of Prof. Pankaj Misra.
My research work includes the growth and characterizations of high- dielectric constant metal oxide nanolaminates based supercapacitors for high density storage applications, which is a growing demand for next generation microelectronic devices. As a part of this project, I have grown different binary oxide thin films such as TiO2, Al2O3, ZnO, MgO, ZrO2, HfO2 and their nanolaminates (NL) with different sublayer thicknesses using ALD, PLD and sputtering techniques. The structural properties of these oxide thin films and their NLs are being investigated using XRR, XRD, RBS, ELLIPSOMETRY, AFM, SEM, XPS, SIMS and TEM measurements. The dielectric and electrical properties of these oxide thin films and NLs are also investigated
using non-destructive current -voltage (I-V) and Impedance spectroscopy (IS) technique. These IS studies have revealed high-k (~ 670) and low loss values (~ 0.17) in these NLs owing to interfacial polarization dominated Maxwell-Wagner relaxation, which is tailored by the growth conditions and sublayer thicknesses. Further these
NL structures have displayed a strong quantum confinement effect and hence influencing both optical and electrical properties of NLs. This artificial periodic structures with the carrier confinement effect has a profound implication on both dielectric properties and conduction mechanisms.
My research experience includes,
Growth of binary metal oxide thin films and their nanolaminates (e.g. Al2O3/TiO2, Al2O3/ZnO, MgO/ZnO NLs) using Atomic Layer Deposition (ALD) and pulsed laser Deposition (PLD) technique.
• Structural Characterization of oxide thin films and their NLs using GIXRD, Diffuse Scattering, XRR,
RBS, AFM, Spectroscopic Ellipsometry, SIMS, XPS, SEM and TEM measurements.
• XRR, Ellipsometry and RBS data simulations for single layer and multilayer thin films.
• Determination of band alignment, analysis of loss spectra and valence band offset across these ultrathin metal oxide heterostructures from Ultraviolet Photoelectron Spectroscopy (UPS) measurements.
• Growth optimization of different metallic thin films (e.g. Au, Pt, Al, Ti, Ni etc.) for top-bottom electrodes
in MIM and MOS capacitor structures using sputtering and evaporation technique.
• CV & CF measurements in these capacitors using Impedance Analyser and DC and pulsed IV measurements using source measure unit (SMU), and Oscilloscope.
• Lithography of different electrode shapes including cross bar geometry.
• Electrical characteristics of MIM capacitors for resistive switching memory applications
• Evaluation and detailed analysis of Capacitor performance parameters like dielectric constant, dielectric loss and AC conductivity of these NLs using impedance spectroscopy (IS) technique.
• Determination of polarization and relaxation mechanisms prevailing in these oxide nanolaminates from temperature dependent dielectric and electric measurements.
• Investigation of surface and interface defect states in these NLs using XPS, Photoluminescence and Resonant photoemission Spectroscopy (ResPES).
• Estimating the role of interfacial inter-diffusion and confinement effect of charge carriers on dielectric and electrical properties of these NLS combining XRR, TEM, SIMS and Impedance spectroscopy.
• Proficient in handling Focused ion beam tools for the fabrication of site-specific electron-transparent
foils of any material with typical dimensions of 15 × 10 × 0.150 µm and cross-sectional sample preparation for TEM measurements
• Detailed chemical analysis of these NL structures using various beamlines of Indus-1 and Indus-2 synchrotron sources, RRCAT, India.
My future research interest includes but not limited to
Growth and characterizations of novel materials for energy and memory storage applications
• Physics of dielectrics, semiconductors and novel materials
• surface and interface properties of multilayers
• Transport properties in technologically important materials
• synthesis and characterizations of 2D materials
• Development of advanced electronic devices related to quantum technology
I believe my research experience will leads to quality research and new development in the field of storage industry. Since I believe in learning of new techniques to unravel new mechanisms, I am open for exploring physics of various other potential 2D materials like MoS2, Graphene and Mxenes. During this research journey,
I have also developed a keen interested in pursuing research related to different other oxide materials towards practical industrial applications such as memristors, resistive switching devices, biocompatible coatings etc. Once i get an opportunity, I am confident that I can learn new aspects of challenging fields and can contribute possitively.
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Physica B: Condensed Matter (2023): 415021-415021
Springer Proceedings in Materialspp.143-147, (2023)
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ano. 6 (2023)
Nanoscaleno. 18 (2023): 8337-8355
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICSno. 14 (2023)
Journal of Materials Science: Materials in Electronicsno. 14 (2023)
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2022)
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