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个人简介
Paras Ajay received the Bachelor of Technology (B.Tech.) degree in mechanical engineering from the Indian Institute of Technology, New Delhi, India, in 2012, and the Ph.D. degree in mechanical engineering from the University of Texas at Austin, Austin, TX, USA, in 2019.
He is currently a Postdoctoral Researcher with the NASCENT Center, University of Texas at Austin. He has published one journal paper on overlay control in nano-imprint lithography, one book chapter on overlay control in advanced lithography, one conference paper which was awarded the best poster award at the 30th American Society for Precision Engineering Conference in 2015. His graduate research has also resulted in five patent applications primarily in the area of nano-precise overlay and alignment control, two of which have been granted, and one licensed by Canon Nanotechnologies, Inc. His research interests lie in the design, fabrication, integration and control of nanofabrication systems, specifically in the subdomains of nano-precise motion control, thermo-mechanical distortion control, thermal management and metrology for advanced nanopatterning and nanofabrication applications.
研究兴趣
论文共 9 篇作者统计合作学者相似作者
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JOURNAL OF MICRO AND NANO-MANUFACTURINGno. 1 (2023)
JOURNAL OF MICRO AND NANO-MANUFACTURINGno. 3 (2022)
Advanced Etch Technology and Process Integration for Nanopatterning XI (2022)
Journal of Micro and Nano-Manufacturingno. 2 (2022)
PROCEEDINGS OF THE 4TH INTERNATIONAL CONFERENCE ON THE INDUSTRY 4.0 MODEL FOR ADVANCED MANUFACTURING (AMP 2019)pp.1-11, (2019)
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