基本信息
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Career Trajectory
Bio
Noriaki Oda received the B.S. and M.S. degrees in electrical engineering from Hokkaido University, Sapporo, Japan, in 1985 and 1987, respectively, and the Ph.D. degree in electronics and applied physics from Tokyo Institute of Technology, Yokohama, Japan, in 2007.
In 1987, he joined NEC Corporation, Sagamihara, Japan, where he engaged in research and development of bipolar devices, multilevel interconnect technology for CMOS devices, etc. He also worked on the development of back-end processes at NEC Electronics Corporation. From 2006 to February 2010, he was temporarily transferred to Semiconductor Leading Edge Technologies, Inc., Tsukuba, Japan. He is currently with Renesas Electronics Corporation, Sagamihara, Japan, developing multilevel Cu interconnects for advanced logic CMOS devices.
Dr. Oda is a member of Institute of Electronics, Information, and Communication Engineers.
Research Interests
Papers共 10 篇Author StatisticsCo-AuthorSimilar Experts
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Interconnect Technology Conference and 2011 Materials for Advanced Metallizationpp.1-3, (2011)
Natsue Y Kawahara,Masayoshi Tagami,B Withers,Yumi Kakuhara, Hajime Imura,Keisuke Ohto,Toshiji Taiji,Kishio Arita, Takakazu Kurokawa,Masao Nagase, T Maruyama,Naoki Oda,
mag(2000)
Cited22Views0Bibtex
22
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mag(1999)
Cited71Views0Bibtex
71
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