基本信息
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Career Trajectory
Bio
Min Hung Lee received the B.S. degree in physics from National Chunghsin University, Taichun, Taiwan, in 1996, and the M.S. degree in physics, and the Ph.D. degree in electrical engineering from National Taiwan University (NTU), Taipei, Taiwan, in 1998 and 2002, respectively.
He is an Engineer with the Electronics Research & Service Organization, Industrial Technology Research Institute (ERSO/ITRI), Hsinchu, Taiwan. His current research interests include RTCVD, strained-Si, SiGe, and SiC MOSFET.
Research Interests
Papers共 243 篇Author StatisticsCo-AuthorSimilar Experts
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IEEE Transactions on Electron Devicesno. 99 (2024): 1-6
IEEE Electron Device Lettersno. 99 (2024): 1-1
K. -Y Hsiang,F. -S Chang,Z. -F Lou,A. Aich, A. Senapati,J. -Y Lee, Z. -X Li, J. -H Chen,C. -H Liu,C. W. Liu,S. Maikap,P. Su,
IEEE TRANSACTIONS ON ELECTRON DEVICESno. 4 (2024): 2708-2713
Y. -T. Tsai,C. -R. Liu, Y. -T. Chen,S. -M. Wang,Z. -K. Chen, C. -S. Pai, Z. -R. Haung,F. -S. Chang, Z. -X. Li,K. -Y. Hsiang,M. -H. Lee,Y. -T. Tang
arXiv (Cornell University) (2023)
S. -C. Lee, Y. -T. Chen,C. -R. Liu,S. -M. Wang,Y. -T. Tang,F. -S. Chang, Z. -X. Li,K. -Y. Hsiang,M. -H. Lee
arXiv (Cornell University) (2023)
2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT)pp.1-1, (2023)
J.-Y. Lee,F.-S. Chang,K.-Y. Hsiang, P.-H. Chen, Z.-F. Luo, Z.-X. Li,J.-H. Tsai,C. W. Liu,Min-Hung Lee
VLSI Technology and Circuitspp.1-2, (2023)
VLSI Technology and Circuitspp.1-2, (2023)
VLSI Technology and Circuitspp.1-2, (2023)
K.-Y. Hsiang, J.-Y. Lee,Z.-F. Lou,F.-S. Chang,Y.-C. Chen, Z.-X. Li,M. H. Liao,C. W. Liu,T.-H. Hou,P. Su,M. H. Lee
IEEE Transactions on Electron Devicesno. 4 (2023): 2142-2146
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