基本信息
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Bio
Matthew Metz was born in Wayne, NB, in 1973. He received the B.S. degree in chemistry from the University of Nebraska–Lincoln, in 1996, and the M.S. degree in chemistry and Ph.D. degree in inorganic chemistry from Northwestern University, Evanston, IL, in 1998 and 2002, respectively. His thesis concerned the development of co-catalysts for Ziegler–Natta olefin polymerization.
In 2002, he joined the Intel Corporation, Hillsboro, OR, where he is currently a Staff Process Engineer involved with gate dielectric films for future transistor generations. He has authored five papers. He holds two patents on high-$\kappa$/metal gate integration and nanotechnology applications.
Research Interests
Papers共 180 篇Author StatisticsCo-AuthorSimilar Experts
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T.D. Ngo, X. Wu,C.J. Dorow, R.K. Grubbs, L. Pinotti,D. Cott,K. Banerjee, H. Medina Silva,I. Hoflijk,A. Vanleenhove,I. Vaesen,T. Conard, S. Ghosh,O. Richard, F.C. Mascarenhas, L. Mana,D. Vanhaeren,T. Nuytten, F. Xi,K. Maxey, A. Kozhakhmetov,N. Arefin, S. Pasko, S. Krotkus, J. Mischke,S. El Kazzi,M. Metz,K.P. O'Brien,U. Avci, C.J. Lockhart De La Rosa,G. Sankar Kar,B. Govoreanu
2024 IEEE International Electron Devices Meeting (IEDM)pp.1-4, (2024)
Ananya Dutta, Akshit Peer,Christopher Jezewski, Saima Siddiqui, Ian Jenkins, Emmanuel Khora, Gauri Auluck, YuWen Huang, Felipe Bedoya,Nafees Kabir, Supriya Mocherla, Puja Rani Saha, Leah Shoer, Kyle Chan, Akhilesh Tanneeru, Jay Gupta, Vijay Bharamaiah Jeevendrakumar, David Collins, Syam Madhusoodhanan, Jeff Bielefeld, William Brezinski, Remi Fayad, Supanee Sukrittanon, Sudipto Naskar, Sreenivas Kosaraju,Nityan Nair, Gurpreet Singh, Joseph D Silva, Cliff Engel, Noel Franco,Brian Krist, Jimmy Wang,Matthew Metz,Mauro Kobrinsky
2024 IEEE International Electron Devices Meeting (IEDM)pp.1-4, (2024)
W. Mortelmans, P. Buragohain, A. Kitamura,C.J. Dorow,C. Rogan, L. Siddiqui,R. Ramamurthy, J. Lux, T. Zhong, S. Harlson, E. Gillispie, T. Wilson, R. Toku,A. Oni,A. Penumatcha, M. Kavrik, M. Jaikissoon,K. Maxey, A. Kozhakhmetov, C-Y. Cheng, C-C. Lin, S. Lee, A. Vyatskikh,N. Arefin, D. Kencke, J. Kevek,T. Tronic,M. Metz,S.B. Clendenning,K.P. O'Brien,U. Avci
2024 IEEE International Electron Devices Meeting (IEDM)pp.1-4, (2024)
Punyashloka Debashis, Hojoon Ryu, Rachel Steinhardt,Pratyush Buragohain,John J. Plombon,Kirby Maxey,Kevin P. O'Brien,Raseong Kim,Arnab Sen Gupta,Carly Rogan, Jennifer Lux,I-Cheng Tung,Dominique Adams, Melisa Gulseren,Ashish Verma Penumatcha,Shriram Shivaraman,Hai Li, Ting Zhong,Shane Harlson,Tristan Tronic,Adedapo Oni,Steve Putna,Scott B. Clendenning,Matthew Metz,Marko Radosavljevic,Uygar Avci,Ian A. Young
NANO LETTERSno. 40 (2024): 12353-12360
W. Mortelmans, P. Buragohain,C. Rogan, A. Kitamura,C. J. Dorow,K. P. O'Brien,R. Ramamurthy, J. Lux, T. Zhong, S. Harlson, E. Gillispie, T. Wilson,Adedapo Oni,A. Penumatcha, M. S. Kavrik,K. Maxey, A. Kozhakhmetov,C. C. Lin, S. Lee, A. Vyatskikh,N. Arefin,P. Fischer, J. Kevek,T. Tronic,M. Metz,S. B. Clendenning,U. Avci
Symposium on VLSI Technologypp.1-2, (2024)
S.-C. Chang, C. Neumann, B. Granados Alpizar, S. Atanasov,J. Peck,N. Kabir, Y.-C. Liao,S. Shivaraman, Wriddhi Chakraborty,N. Haratipour,I-Cheng Tung, V. Nikitin, G. Allen,T. Hoff,A. Oni,T. Tronic, A. Roy, H. Li,F. Hamzaoglu,M. Metz, I. Young,J. Kavalieros,U. Avci
Symposium on VLSI Technologypp.1-2, (2024)
A. Penumatcha,K. P. O’Brien,K. Maxey, W. Mortelmans, R. Steinhardt, S. Dutta,C. J. Dorow, C. H. Naylor A., Kitamura, T. Zhong,T. Tronic, P. Buragohain,C. Rogan,C-C. Lin, M. Kavrik, J. Lux,A. Oni, A. Vyatskikh,S. Lee,N. Arefin,P. Fischer, S. Clenndenning,M. Radosavljevic,M. Metz,U. Avci
2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)
C. H. Naylor,Kirby Maxey,C. Jezewski,K. P. O'Brien,A. V. Penumatcha,M. S. Kavrik,B. Agrawal, C. V. Littlefield, J. Lux,B. Barley,Justin R. Weber,A. Sen Gupta,C. J. Dorow,N. Arefin,S. King,R. Chebiam, J. Plombon,S. B. Clendenning,U. E. Avci,Mauro J. Kobrinsky,M. Metz
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (2023)
C. J. Dorow,T. Schram,Q. Smets,K. P. O’Brien,K. Maxey,C.-C. Lin,L. Panarella,B. Kaczer,N. Arefin, A. Roy, R. Jordan,A. Oni,A. Penumatcha,C. H. Naylor, M. Kavrik,D. Cott, B. Graven,V. Afanasiev,P. Morin,I. Asselberghs, C. J. Lockhart de La Rosa,G. Sankar Kar,M. Metz,U. Avci
2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)
Sou-Chi Chang,Kisung Chae,Mihaela I. Popovici,Chia-Ching Lin, Saima Siddiqui,I-Cheng Tung,Jasper Bizindavyi, Bernal Granados Alpizar,Nazila Haratipour,Matthew Metz,Jack Kavalieros,Gouri S. Kar,Andrew Kummel,Kyeongjae Cho,Uygar E. Avci
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Author Statistics
#Papers: 180
#Citation: 8842
H-Index: 49
G-Index: 85
Sociability: 6
Diversity: 1
Activity: 2
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