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个人简介
Milton L. Peabody received the B.S. degree from University of Maine, Orono, in 1980.
In February 1980, he joined Bell Laboratories, Murray Hill, NJ, where he has been in the Advanced Lithography Research area, has been involved with the Electron Beam Exposure System IV for opticial photomask lithography, and where he was a member of the Photomask Development Shop in the inspection, repair, and metrology areas. In the 1990s, he was a member of the SCALPEL project, electron beam lithography system, involved in wet silicon deep etching and thin metal low stress films for the electron beam membrane mask. In 2000, he joined the Tuned Frequency Resonator group to do trench etching for the membrane release in this device. Since 2002, he has been involved in semiconductor laser research, working on the processing of the quantum cascade laser devices.
研究兴趣
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Microelectronic Engineeringno. 1-4 (1999): 271-274
作者统计
#Papers: 8
#Citation: 367
H-Index: 6
G-Index: 8
Sociability: 4
Diversity: 1
Activity: 0
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