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Research Interests

Papers共 21 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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引用量
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期刊级别
合作者
合作机构
Characterization and mitigation of local wafer deformations introduced by direct wafer-to-wafer bonding
Richard J. F. van Haren, Suwen Li, Mart Baars, Blandine Minghetti,Leon van Dijk, Ivanie Mendes,Karine Abadie,Marie-Line Pourteau,Gaelle Mauguen,Michael May,Viorel Balan,Frank Fournel,
Novel Patterning Technologies 2024 (2024)
Cited0Views0Bibtex
0
0
New technique for measuring free-form wafer shape to enable wafer distortion predictions
Kiril Ivanov Kurtev, Guillermo Castro Luis,Juan M. Trujillo-Sevilla,Jan O. Gaudestad,Richard van Haren,Leon Van Dijk,Ronald Otten
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
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0
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Enabling layer transfer and Back-Side Power Delivery Network applications by wafer bonding and scanner correction optimizations
Richard van Haren, Suwen Li, Blandine Minghetti,Leon van Dijk, Klaas Brantjes,Frank Fournel,Gaelle Mauguen,Ivanie Mendes, Celine Lapeyre, Marie-Line Pourteau,Michael May,Laurent Pain,
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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0
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Die-Level Nano-topography Metrology to characterize the stress-induced In-Plane Distortion contribution to overlay
Viorel Balan, Florent Michel, Ivanie Mendes, Celine Lapeyre,Lionel Vignoud,Ronald Otten,Orion Mouraille,Leon van Dijk, Blandine Minghetti, Jerome Depre,Richard van Haren
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Computational overlay as enabler for enhanced on-product overlay control
Leon van Dijk,Kedir M. Adal, Sepideh Golmakaniyoon,Bertrand Le-Gratiet,Niyam Haque,Reza Sahraeian, Auguste Lam,Richard van Haren
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-6, (2022)
Cited1Views0EIWOSBibtex
1
0
On-product overlay characterization after stressed layer etch
Richard Johannes Franciscus Van Haren,Orion Mouraille,Oktay Yildirim,Leon van Dijk,Kaushik A. Kumar, Yannick Feurprier,Jan Hermans
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series (2021): 92-105
Cited0Views0Bibtex
0
0
Excursion detection and root-cause analysis using virtual overlay metrology
Leon van Dijk,Kedir M. Adal, Mathias Chastan,Auguste Lam, Richard Johannes Franciscus Van Haren
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 760-775
Cited3Views0Bibtex
3
0
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