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Laurène Youssef was born in Lebanon in 1992. After completing the B.S. degree in general chemistry, she received the M.S. degree in physical chemistry of materials from Lebanese University, Beirut, in 2015. She moved to France and obtained the double Ph.D. degree in physical chemistry and materials science from the University of Montpellier, France and Lebanese University, Beirut, in 2018. Her field of study was centered on plasma deposition mechanisms. From 2018 till present, she is a Postdoctoral Fellow Researcher with the Laboratoire des Technologies de la Microélectronique, a CNRS institute located in Grenoble, France and integrated to the site of CEA Leti. Her works are concentrated on developing plasma etching techniques of silicon and silicon nitride devices for photonics, nonlinear optics, and quantum applications. Dr. Youssef received two excellence awards during her B.S. in 2013 and M.S. in 2015 and contributed to the conception of a prototype plasma reactor in Lebanese University during her PhD.
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