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个人简介
Lisa F. Edge (M'07) received the B.S. and M.S. degrees in materials science and engineering, both in 2002, and the Ph.D. degree in materials science and engineering in 2006 from the Pennsylvania State University, University Park. While pursing the M.S. degree, she worked on pulsed laser deposition of thin films for decoupling capacitor applications. Her Ph.D. focused on molecular beam deposition of rare-earth materials for high-$k$ gate dielectric applications.
She then joined IBM Research at Albany Nanotech, Albany, NY, where she is currently working on the process development of new high-$k$ and metal gate stacks for advanced CMOS devices. She is the author or a coauthor of over 30 publications in journals and conferences proceedings and has four pending U.S. patents.
Dr. Edge is a member of the IEEE Reliability Society and the Women in Engineering Society.
研究兴趣
论文共 124 篇作者统计合作学者相似作者
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PRX QUANTUMno. 2 (2021): 020309
J. Kerckhoff, B. Sun,B. H. Fong,C. Jones,A. A. Kiselev, D. W. Barnes,R. S. Noah,E. Acuna,M. Akmal,S. D. Ha,J. A. Wright,B. J. Thomas,
PRX QUANTUMno. 1 (2021)
PHYSICAL REVIEW Bno. 3 (2020): 165305
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作者统计
#Papers: 124
#Citation: 2946
H-Index: 28
G-Index: 48
Sociability: 6
Diversity: 3
Activity: 53
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