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Bio
Lambert Alff (Member, IEEE) was born in Köln, Germany, in 1963. He received the Dipl.Phys. and Ph.D. degrees in physics from the Eberhard Karls University of Tübingen, Tübingen, Germany, in 1992 and 1995, respectively.
From 1996 to 1997, he worked at the Electrotechnical Laboratory (ETL), Tsukuba, Japan. After returning from Japan, he was employed as an Assistant Professor at the University of Köln, Köln, until 2000, and then at the Technical University of München, Munich, Germany, until 2004. He received his first full professorship position at the Technical University of Wien, Vienna, Austria, for materials in electrical engineering. Since 2005, he has been leading the Chair of Advanced Thin Film Technology (ATFT) at the Technische Universität Darmstadt (TU Darmstadt), Darmstadt, Germany. From 2006 to 2014, he was the Dean of Study at the Materials Science Department. He has an H-index (web of science) of 33 gathered from over 200 articles and patents.
Dr. Alff was an elected member of the senate of TU Darmstadt from 2001 to 2019. He received a prize in academic teaching by Freunde der TU Darmstadt and the Athene-prize for interdisciplinary teaching of the Carlo and Karin Giersch Foundation. In 2014, he hosted the German Molecular Beam Epitaxy Workshop at TU Darmstadt. He received postdoctoral fellowships from the Science and Technology Agency (STA), Japan, and the Feodor Lynen foundation, Germany.
Research Interests
Papers共 344 篇Author StatisticsCo-AuthorSimilar Experts
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ADVANCED FUNCTIONAL MATERIALS (2024)
Stipo Matic, Yating Ruan, Alejandro Jiménez Sáez, Zhili Liang,Federica Bondino,Ilargi Napal, Elena Magnano,Lambert Alff, Philipp Komissinskiy,Rolf Jakoby
Ceramics International (2024)
Humera Khatoon Siddiqui,Aamir Iqbal Waidha, Sabine Kanbach, Jasnamol Pezhumkattil Palakkal, Steffen Haller, Sandeep Yadav, Peter Kleinschmidt,Jörg J. Schneider, Oliver Clemens,Lambert Alff, Ulrike Ingrid Kramm
F. L. Aguirre,E. Piros,N. Kaiser,T. Vogel,S. Petzold,J. Gehrunger,C. Hochberger, T. Oster, K. Hofmann,J. Suñé,E. Miranda,L. Alff
Scientific Reportsno. 1 (2024): 1-8
E. Miranda,E. Piros,F.L. Aguirre, T. Kim, P. Schreyer,J. Gehrunger, T. Schwarz, T. Oster, K. Hofmann,J. Suñé,C. Hochberger,L. Alff
IEEE Electron Device Lettersno. 99 (2024): 1-1
ULTRAMICROSCOPY (2024): 113939-113939
ADVANCED ELECTRONIC MATERIALSno. 4 (2024): n/a-n/a
Applied Physics Lettersno. 2 (2023)
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