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Research Interests

Papers共 14 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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期刊级别
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Electron Beam Mask Writer Ebm-8000p For High-Throughput Mask Production
Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu,Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami,Takao Tamura,Kenji Ohtoshi,
NOVEL PATTERNING TECHNOLOGIES FOR SEMICONDUCTORS, MEMS/NEMS AND MOEMS 2020 (2020): 194-199
Cited0Views0Bibtex
0
0
Multibeam Mask Writer Mbm-1000
Hiroshi Matsumoto,Hideo Inoue,Hiroshi Yamashita,Takao Tamura,Kenji Ohtoshi
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMSno. 3 (2018)
Cited8Views0Bibtex
8
0
Multi-beam mask writer MBM-1000
Hiroshi Matsumoto,Hideo Inoue,Hiroshi Yamashita, Ryosuke Ueba,Kenji Otoshi,Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi,Chan-Uk Jeon
Photomask Technology (2017)
Cited0Views0Bibtex
0
0
Ebm-8000: Eb Mask Writer For Product Mask Fabrication Of 22-Nm Half-Pitch Generation And Beyond
Shusuke Yoshitake,Takashi Kamikubo,Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando,Tomohiro Iijima,Kenji Ohtoshi,Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi,
PHOTOMASK TECHNOLOGY 2011 (2011)
Cited11Views0Bibtex
11
0
Electron beam mask writer EBM-7000 for hp 32nm generation
Takashi Kamikubo,Kenji Ohtoshi,Noriaki Nakayamada,Rieko Nishimura,Hitoshi Sunaoshi,Kiminobu Akeno,Soichiro Mitsui,Yuichi Tachikawa,Hideo Inoue,Susumu Oogi, Hitoshi Higurashi, Akinori Mine,
Proceedings of SPIE, the International Society for Optical Engineering (2009): 393-402
Cited9Views0Bibtex
9
0
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