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论文共 24 篇作者统计合作学者相似作者
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Van Tuong Pham, Jeonghoon Lee,Kaushik Sah, Ying-Lin Chen, Seonggil Heo, Soobin Hwang,Kenichi Miyaguchi,bappaditya Dey, Maria V. Chistiakova,Peter De Schepper,Philippe Bezard,Sara Paolillo,
Advances in Patterning Materials and Processes XLI (2024)
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
Syamashree Roy,Arame Thiam,Kaushik Sah,Yannick Feurprier, Nobuyuki Fukui,Kathleen Nafus,Kenichi Miyaguchi,Dieter Van Den Heuvel, Balakumar Baskaran,Joost Bekaert, Andrew Cross,Mircea Dusa,
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang,Changmin Park, Kyoil Koo, Seongtae Jeong,
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
Kaushik Sah,Andrew Cross,Sayantan Das, Roberto Fallica,Jeonghoon Lee, Ryan Ryoung Kim,Sandip Halder,Ethan Maguire, Ana-Maria Armeanu, Monica Sears,Neal Lafferty,Vlad Liubich,
International Conference on Extreme Ultraviolet Lithography 2022 (2022)
Kaushik Sah,Sayantan Das,Andrew Cross, Kay Peng,Kha Tran,Binesh Babu, Ardis Liang,Danilo De Simone,Philippe Leray,Sandip Halder
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 1161128
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 624-628
Sayantan Das,Kaushik Sah, Ardis Liang,Hemanta Roy,Kha Tran,Binesh Babu, Arjun Hegde,Andrew Cross,Philippe Leray,Sandip Halder
International Conference on Extreme Ultraviolet Lithography 2021 (2021): 82-92
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