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2-color, STED like, lithography is known. We've determined that while 9 nm single feature printing has been demonstrated the method is pitch resolution limited due to background buildup of final photoproduct. A remedy may exist using 3+ colors. We're researching 3-color photoactivated molecular switches to be used for super-resolution nanolithography using computational chemistry driven synthesis, femtosecond and slower photokinetcs and multi-wavelength interference & direct-write lithography.
Research Interests
Papers共 128 篇Author StatisticsCo-AuthorSimilar Experts
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ano. 3 (2024)
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
Sandra A. Gutierrez Razo,Nikolaos Liaros, Nicholas Fisher,Andrea N. Zeppuhar, Mona Abostate,John S. Petersen,Daniel E. Falvey,Amy S. Mullin,John T. Fourkas
Novel Patterning Technologies 2024 (2024)
Kevin M. Dorney,Fabian Holzmeier, Nicola N. Kissoon,Esben W. Larsen,Dhirendra P. Singh, Shikhar Arvind, Sayantani Santra,Roberto Fallica,Marina Y. Timmermans,Ivan Pollentier,Igor A. Makhotkin,Vicky Philipsen,Stefan De Gendt,Claudia Fleischmann,Paul A. W. van der Heide,John S. Petersen
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 4 (2024)
Nicholas Fisher, Shuhei Yamaguchi,Sandra A. Gutierrez Razo,Nikolaos Liaros,Andrea N. Zeppuhar,Daniel E. Falvey,John S. Petersen,John T. Fourkas
Novel Patterning Technologies 2024 (2024)
Marziogiuseppe Gentile,Marius Gerlach,Robert Richter,Michiel J. van Setten,John S. Petersen,Paul van der Heide,Fabian Holzmeier
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
Photon Sources for Lithography and Metrology (2023)
Kevin Dorney, Nicola N. Kissoon,Fabian Holzmeier,Esben W. Larsen,Dhirendra P. Singh, Shikhar Arvind, Sayantani Santra,Roberto Fallica,Igor Makhotkin,Vicky Philipsen,Stefan De Gendt,Claudia Fleischmann,Paul A. W. van der Heide,John S. Petersen
Optical and EUV Nanolithography XXXVI (2023)
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
Cong Que Dinh,Seiji Nagahara,Yuhei Kuwahara,Arnaud Dauendorffer,Keisuke Yoshida,Soichiro Okada,Tomoya Onitsuka,Shinichiro Kawakami,Satoru Shimura,Makoto Muramatsu,Kosuke Yoshihara,John S. Petersen,Danilo De Simone,Philippe Foubert,Geert Vandenberghe,Lior Huli,Steven Grzeskowiak,Alexandra Krawicz,Nayoung Bae,Kanzo Kato,Kathleen Nafus,Angelique Raley
Journal of Photopolymer Science and Technologyno. 1 (2022): 87-93
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Author Statistics
#Papers: 128
#Citation: 4361
H-Index: 29
G-Index: 64
Sociability: 6
Diversity: 1
Activity: 1
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