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个人简介
Joel K.W. Yang is an Associate Professor at the Singapore University of Technology and Design. He received his SM (2005) and PhD (2009) degrees from the Massachusetts Institute of Technology, in Electrical Engineering and Computer Science. His research interests are in nanoplasmonics, plasmonic color printing, field-enhancement in ultra-small gaps, and nanofabrication with sub-10-nm resolutions. He holds a joint appointment at the Institute of Materials Research and Engineering (IMRE) of A*STAR where he is co-head of the Plasmonic and Semiconductor Nanostructures Lab. He is recognized for his pioneering work in color printing at the ultimate resolution limit (100,000 dpi) using plasmonic nanostructures, and for the widely-used “salty-developer” to improve the resolution of electron beam lithography. He has published high-impact papers in Science, Nature Nanotechnology, Nano Letters, ACS Nano, and Nature Communications. He was the recipient of the MIT Technology Review TR35@Singapore award, and the Singapore Young Scientist Award.
研究兴趣
论文共 252 篇作者统计合作学者相似作者
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Nature communicationsno. 1 (2024): 3719-3719
Jiahui Xu,Hailong Liu,Hongtao Wang,Yiming Wu,Hao Wang, Benjamin Yue Hao Tan,Joel K. W. Yang,Renaud A. L. Vallee,Xiaogang Liu
CHEMno. 2 (2024)
Md Abdur Rahman,Soroosh Daqiqeh Rezaei,Deepshikha Arora, Hao Wang,Tomohiro Mori, Ser Chern Chia,John You En Chan,Parvathi Nair Suseela Nair, Siam Uddin,Cheng-Feng Pan,Wang Zhang,Hongtao Wang,
Nanophotonicsno. 0 (2024)
Optics and Photonics Newsno. 4 (2024)
ACS photonicsno. 3 (2024): 816-865
ADVANCED OPTICAL MATERIALSno. 5 (2024)
Chia-Te Chang,HongTao Wang,Wang Zhang,Hao Wang, Chin-Yi Kuan, Xiaoyan Zhou, Chia-Ming Yang,Joel K. W. Yang
SPIE Future Sensing Technologies 2024 (2024)
Next Nanotechnology (2024): 100062
Light: Advanced Manufacturingno. 3 (2023): 243-250
NANOPHOTONICSno. 8 (2023): 1359-1361
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