基本信息
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Career Trajectory
Bio
J. P. Singh received the Ph.D. degree from the Inter-University Accelerator Centre (IUAC), India, where he developed a UHV-STM system attached to the 15 MV accelerator beamline. He completed his postdoctoral research with the Rensselaer Polytechnic Institute, NY, USA. He is a Professor with the Department of Physics, Indian Institute of Technology Delhi, India. He has excellent experience in the area of nanostructure and thin film fabrication using glancing angle deposition. He has published more than 110 research articles in international journals and has two patents. He received several awards, including the Outstanding Young Faculty Award from IIT Delhi and the Fellow Medal from the International Association of Advance Material (IAAM).
Research Interests
Papers共 99 篇Author StatisticsCo-AuthorSimilar Experts
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期刊级别
合作者
合作机构
International Journal of Hydrogen Energy (2024): 826-838
ACS APPLIED NANO MATERIALSno. 7 (2024): 6736-6748
Journal of Polymer Researchno. 6 (2024): 1-9
Materials Science in Semiconductor Processing (2024): 108712
Frontiers of Materials Scienceno. 1 (2024): 1-17
ACS APPLIED NANO MATERIALSno. 11 (2023): 9236-9246
ACS applied materials & interfacesno. 29 (2023): 35001-35013
Composites Part A: Applied Science and Manufacturing (2023): 107614
Biosensorsno. 7 (2023): 679-679
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Author Statistics
#Papers: 89
#Citation: 2205
H-Index: 26
G-Index: 44
Sociability: 5
Diversity: 0
Activity: 1
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