基本信息
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个人简介
Jisheng Pan received the B.Sc. degree in physics from Hangzhou University, Hangzhou, China, in 1985, the M.Sc. degree in nuclear physics from the Shanghai Institute of Nuclear Research, Shanghai, China, in 1988, and the Ph.D. degree in surface science from the National University of Singapore (NUS), Singapore, in 1998.
Currently, he is working in the Material Sciences and Characterization Laboratory, Institute of Materials Research and Engineering, Singapore. His areas of research interest are surface science and analysis, synthesis, and characterization of thin films for microelectronic device fabrication, and ion beam modification of semiconductor surfaces. He has published more than 70 technical papers in his research areas.
研究兴趣
论文共 342 篇作者统计合作学者相似作者
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Matej Sebek,Zeng Wang,Norton Glen West,Ming Yang, Darren Chi Jin Neo,Xiaodi Su, Shijie Wang,Jisheng Pan,Nguyen Thi Kim Thanh,Jinghua Teng
npj 2D Materials and Applicationsno. 1 (2024): 1-9
Surface and Coatings Technology (2023): 129623-129623
Advanced materialsno. 33 (2023)
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作者统计
#Papers: 341
#Citation: 9681
H-Index: 51
G-Index: 83
Sociability: 7
Diversity: 3
Activity: 86
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