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Research Interests

Papers共 24 篇Author StatisticsCo-AuthorSimilar Experts

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Progress in Inverse Lithography Technology
Futian Wang,Juan Wei, Cuixiang Wang,Jiang Miao, Yu Mu, Chunlong Yu, Ruihua Liu, Fu Li, Jingjing Fan, Jinlai Liu, Jingkang Qin, Enqiang Tian,Song Sun, Chong Wang, Xiaonan Liu, Hao Yang,Di Liang,Binbin Yan,Liang Li,Qingchen Cao,Jiangliu Shi
LASER & OPTOELECTRONICS PROGRESSno. 21 (2024)
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Balancing Mask Manufacturability and Image Quality with Inverse Lithography: a Study on Variable Fracture Sizes
Fu Li, Yu Mu, Jingjing Fan, Chunlong Yu, Ruihua Liu,Song Sun, Chong Wang,Jiangliu Shi,Qingchen Cao
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
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逆向光刻工艺进展
Wang Futian,Wei Juan, Wang Cuixiang,Jiang Miao, Mu Yu, Yu Chunlong, Liu Ruihua, Li Fu, Fan Jingjing, Liu Jinlai, Qin Jingkang, Tian Enqiang,Sun Song, Wang Chong, Liu Xiaonan, Yang Hao,Liang Di,Yan Binbin, Li Liang,Cao Qingchen,Shi Jiangliu
Laser &amp Optoelectronics Progressno. 21 (2024)
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Optimization of Lithography Performance at Different Manhattan Levels of ILT and Electron Beam Shot Size
Cuixiang Wang, Yu Mu, Futian Wang,Juan Wei, Ruihua Liu, Enqiang Tian,Di Liang,Yufei Sha, Yaokun Li, Hao Yang,Song Sun,Miao Jiang,Qingchen Cao,Jiangliu Shi
Photomask Technology 2024 (2024)
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Accurate ILT Model Calibration Using Curvilinear Mask and All-Angle Gauges
Juan Wei,Peng Xu, Guangyu Sun, Jingkang Qin, Jinlai Liu, Cuixiang Wang,Futian Wang,Jiangliu Shi,Qingchen Cao
Photomask Technology 2024 (2024)
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Contour-based Mask Quantization Methodology for Curvilinear ILT Mask and on Wafer Performance Analysis
Futian Wang, Xiaonan Liu,Juan Wei,Miao Jiang, Cuixiang Wang, Yu Mu, Enqiang Tian, Yaokun Li,Song Sun, Ruihua Liu, Jiahao Xi,Yufei Sha,Di Liang, Hao Yang,Qingchen Cao,Jiangliu Shi
Photomask Technology 2024 (2024)
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Author Statistics

#Papers: 24

#Citation: 20

H-Index: 2

G-Index: 4

Sociability: 4

Diversity: 1

Activity: 1

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