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Jai Kwang Shin was born on January 7, 1964 in Seoul, South Korea. He received the B. Sc. degree in chemistry from Seoul National University, and the Ph.D. degree in physical and computational chemistry from Korea Advanced Institute of Science and Technology, Taejon, South Korea, in 1986 and 1992, respectively.
Since 1992, he has been with Samsung Advanced Institute of Technology (SAIT), Kiheung, South Korea, where he is working on semiconductor process modeling and simulation with a focus on plasma processing. He spent a year working on plasma equipment modeling in the University of Illinois at Urbana/Champaign. Since 1997, he has lead a materials and process simulation group in SAIT.
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2023 Conference on Lasers and Electro-Optics (CLEO)pp.1-2, (2023)
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NATURE ELECTRONICSno. 3 (2023): 216-224
LIGHT-EMITTING DEVICES, MATERIALS, AND APPLICATIONS XXVI (2022)
Research Square (Research Square) (2020)
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