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个人简介
His current interests include growth and properties of barrier thin films; kinetics of silicon-germanium alloy epitaxy and nanocrystal dot growth from hydrides; organometallic precursor chemistry in thin-film growth; thin-film and quantum-dot self-assemblies at interfaces; and growth and properties of dielectric films.,Prof. Ekerdt is a Fellow of the American Institute of Chemical Engineers. He was a recipient of the Charles M. A. Stine Award in Materials Science and Engineering from the American Institute of Chemical Engineers in 2001 and the Joe J. King Professional Engineering Achievement Award from The University of Texas at Austin in 2005.
研究兴趣
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ano. 2 (2024)
Nanoscaleno. 21 (2023): 9432-9439
Journal of vacuum science & technologyno. 3 (2023)
Applied Surface Science (2023): 157432
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ano. 3 (2023)
Journal of Vacuum Science & Technology Ano. 6 (2022)
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