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个人简介
Gregor Hlawacek is group leader of the (Ion Induced Nanostructures)[http://www.hzdr.de/fwiz-n] group at the Ion Beam Center of the Helmholtz-Zentrum Dresden-Rossendorf in Germany. He received his PhD in materials science from the Montanuniversität Leoben for his work on the growth of organic semiconductor thin films. Since 2009 he works with Helium Ion Microscopy (HIM) and has published several papers and book chapters on the application and further development of the method. He also edited the first book on Helium Ion Microscopy. His current work is focused on the development of new in-situ characterization and modification techniques and the use of focused ion beam for materials science questions.
研究兴趣
论文共 137 篇作者统计合作学者相似作者
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PRAKTISCHE METALLOGRAPHIE-PRACTICAL METALLOGRAPHYno. 3 (2024): 205-206
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M. Hollenbach,N. Klingner, P. Mazarov, W. Pilz, A. Nadzeyka, F. Mayer, N. V. Abrosimov,L. Bischoff,G. Hlawacek,M. Helm,G. V. Astakhov
arxiv(2024)
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CERAMICS INTERNATIONALno. 5 (2024): 7691-7701
M. Hollenbach, C. Kasper,D. Erb,L. Bischoff,G. Hlawacek, H. Kraus,W. Kada, T. Ohshima,M. Helm,S. Facsko,V. Dyakonov,G. V. Astakhov
ADVANCED FUNCTIONAL MATERIALS (2024)
Zahra Fekri,Phanish Chava,Gregor Hlawacek,Mahdi Ghorbani‐Asl,Silvan Kretschmer, Wajid Awan, Vivek Mootheri,Tommaso Venanzi, Natalia Sycheva,Antony George,Andrey Turchanin,Kenji Watanabe,
Advanced Electronic Materials (2024)
Mohamed M.K. Mahfouz,Gregor Skok,Jean Sciare,Michael Pikridas,M. Rami Alfarra, Shamjad Moosakutty,Balint Alfoldy,Matic Ivančič,Martin Rigler,Asta Gregorič,Rok Podlipec, Svenja Lohmann,
Rok Podlipec, Aleksandar Sebastijanovič,Hilary Cassidy,Lianyong Han,Pernille Danielsen,Petra Čotar,Hana Kokot, Benjamin Koroševič Koser, Ana Vencelj,Luka Pirker,Polona Umek,Gregor Hlawacek,
biorxiv(2024)
Serhii Sorokin,Md Shadab Anwar,Gregor Hlawacek,Richard Boucher, João Salgado-Cabaco,Kay Potzger,Jürgen Lindner,Jürgen Faßbender,Rantej Bali
New Journal of Physicsno. 9 (2023): 093036
J. von Borany,Hans‐Jürgen Engelmann,Karl-Heinz Heinig,E. Amat,Gregor Hlawacek, Fabian J. Klüpfel,René Hübner, W. Möller,Marie-Line Pourteau,Guido Rademaker,Mathias Rommel,L. Baier,
Semiconductor Science and Technologyno. 5 (2023): 055011-055011
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