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个人简介
Hiromi Oohashi (M’03) was born in Tokyo, Japan, 1961. She received the B.S. degree in applied physics from Waseda University, Tokyo, Japan, in 1985, and the M.S. and Ph.D. degrees in physical electronics from the Tokyo Institute of Technology, Tokyo, Japan, in 1987 and 2007.
Since joining Nippon Telegraph and Telephone (NTT) Basic Research Laboratories, NTT Public Corporation, Tokyo, Japan, in 1987, she has involved in research on optical nonlinear processes in semiconductor materials. In 1993, she moved to the NTT Opto-electronics Laboratories and involved in research and development related to the temperature dependence and reliability of semiconductor lasers. Her current research interests include the development of optical devices for WDM systems.
Dr. Oohashi is a member of the Institute of Electrical and Electronics Engineers, the Japan Society of Applied Physics, and the Institute of Electronics, Information and Communication Engineers of Japan.
研究兴趣
论文共 70 篇作者统计合作学者相似作者
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Toshimasa Fujisawa, Seiji Kanazawa, Hideo Ishii,Nobuhiro Nunoya,Yoshihiro Kawaguchi,Akira Ohki,Naoki Fujiwara,Kazuya Takahata, Ryuzu Iga,Fumiyoshi Kano,Hiromi Oohashi
Optical Communicationpp.1-3E, (2010)
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作者统计
#Papers: 60
#Citation: 1036
H-Index: 20
G-Index: 31
Sociability: 5
Diversity: 2
Activity: 0
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