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个人简介
Prof. Smith and his co-workers were responsible for a number of innovations in nanoscale science and engineering, including: comformable-photomask lithography, x‑ray lithography, the phase-shift mask, the attenuating phase shifter, spatial-phase-locked e‑beam lithography, achromatic-interference lithography, coherent-diffraction lithography, immersion photolithography, zone-plate-array lithography, absorbance-modulation optical lithography, interferometric mask alignment, graphoepitaxy, directed self-assembly, nanomembrane assembly, and a variety of quantum-effect, short-channel, single-electron, nanomagnetic, photonic-crystal and microphotonic devices. Prof. Smith holds over 40 US patents and has published over 400 technical articles.
研究兴趣
论文共 578 篇作者统计合作学者相似作者
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Bno. 6 (2023)
2018 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)pp.1-2, (2018)
crossref(2017)
mag(2015)
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Paul J Planet, Luis Diego Archila Diaz,Sergiosorestis Kolokotronis,Apurva Narechania,J Reyes,G Xing,Sandra Rincon,Henry I Smith,Diana Panesso, C G Ryan, Douglas Smith,M Guzman,
Norman R Draper,Henry I Smith
mag(2014)
NANOLITHOGRAPHY: THE ART OF FABRICATING NANOELECTRONIC AND NANOPHOTONIC DEVICES AND SYSTEMSpp.179-193, (2014)
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