基本信息
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Bio
Horng-Chih Lin (S'91–M'95–SM'01) was born in I-Lan, Taiwan, R.O.C., on August 1, 1967. He received the B.S. degree from the Department of Physics, National Central University, Chung-Li, Taiwan, R.O.C., in 1989 and the Ph.D. degree from the Institute of Electronics, National Chiao-Tung University (NCTU), Hsinchu, Taiwan, R.O.C., in 1994.
From 1994 to 2004, he was with the National Nano Device Laboratories (NDL), Taiwan, R.O.C., where he was engaged in the research projects of nanoscale device technology development. He joined the faculty of NCTU in 2004, where he is currently an Associate Professor of the Department of Electronics Engineering and the Institute of Electronics. His current research interests include thin-film-transistor (TFT) fabrication and characterization, reliability of CMOS devices, and novel SOI device technology. He has authored or coauthored over 100 technical papers in international journals and conferences in the above areas.
Dr. Lin served on the program committee of the International Reliability Physics Symposium (IRPS) in 2001 and 2002. He also served on the program committee of the International Conference on Solid State Devices and Materials (SSDM) in 2005 and 2006.
Research Interests
Papers共 316 篇Author StatisticsCo-AuthorSimilar Experts
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JAPANESE JOURNAL OF APPLIED PHYSICSno. 3 (2024)
IEEE Journal of the Electron Devices Society (2023): 619-623
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY (2023): 54-59
Research Square (Research Square) (2023)
Po-Yu Hong, Chin-Hsuan Lin, I.-Hsiang Wang, Yu-Ju Chiu,Bing-Ju Lee,Jiun-Chi Kao,Chun-Hao Huang,Horng-Chih Lin,Thomas George,Pei-Wen Li
IEEE Transactions on Electron Devicesno. 4 (2023): 2113-2120
Po-Yu Hong, Chin-Hsuan Lin, I.-Hsiang Wang, Yu-Ju Chiu,Bing-Ju Lee,Jiun-Chi Kao,Chun-Hao Huang,Horng-Chih Lin,Thomas George,Pei-Wen Li
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSINGno. 2 (2023): 1-1
2023 Silicon Nanoelectronics Workshop (SNW)pp.95-96, (2023)
JAPANESE JOURNAL OF APPLIED PHYSICSno. SC (2023)
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Author Statistics
#Papers: 320
#Citation: 4073
H-Index: 28
G-Index: 52
Sociability: 6
Diversity: 1
Activity: 1
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