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Hi-Deok Lee received the B.S., M.S., and Ph.D. degrees from Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Korea, in 1990, 1992, and 1996, respectively, all in electrical engineering.
In 1996, he joined LG Semicon Company, Ltd, (Now Hynix Semiconductor Inc.) Choongbuk, Korea, where he has been involved in the development of 0.35 $\mu$ m, 0.25 $\mu$ m, and 0.18 $\mu$ m CMOS technologies, respectively. He was also responsible for the development of 0.15 and 0.13 $\mu$ m CMOS technologies. In 2001, he joined the Chungnam National University, Daejeon, Korea, as an Assistant Professor in the Department of Electronics Engineering. His research interests are in the areas of nanoscale CMOS technology and its reliability physics, RF CMOS device modeling and circuit design, crosstalk and time delay of interconnection lines. His interest also includes SoC design.
Dr. Lee is a Member of the Institute of Electronics Engineers of Korea.
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Chemical Society reviewsno. 5 (2024): 2530-2577
NANOSCALEno. 9 (2024): 4609-4619
MATERIALS LETTERS (2024): 136193
IEEE Sensors Journalno. 99 (2023): 1-1
IEEE Transactions on Circuits and Systems II: Express Briefsno. 6 (2023): 1866-1870
S. B. Eadi,Jae Sub Oh, Chaehwan Kim,Gapseop Sim, Kwanghee Kim,Hee Yeoun Kim, Jae Jeong Kim, Hyeong Rok Do, Sung-il Chu,Seng Hwan Jung,H. D. Lee
INTERNATIONAL JOURNAL OF HYDROGEN ENERGYno. 33 (2023): 12534-12539
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