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个人简介
Dr. Stafford is a member of the Functional Nanostructured Materials Group in the Materials Science and Engineering Division at the National Institute of Standards and Technology (NIST). Dr. Stafford's research interests focus on the application of electrochemical and analytical methods to understand electrodeposition processes. Recently he has developed an in situ wafer curvature method for studying surface and growth stress with resolution sufficient to study the adsorption of molecular monolayers onto the electrode surface. These measurements are particularly well-suited for studying underpotential metal deposition, self-assembled monolayers, and competitive adsorption processes. Dr. Stafford has authored over 100 technical papers and a book chapter on the electrodeposition of aluminum alloys from chloroaluminate ionic liquids. He is a member of the American Chemical Society, the International Society of Electrochemistry, and a Fellow of the Electrochemical Society.
研究兴趣
论文共 150 篇作者统计合作学者相似作者
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Carlos Hangarter,Eric Daniel Rus,Yihua Liu,Jae Shin,Vladimir Oleshko, Hyun Ro, Russell Composto,Christopher Soles,Joseph A. Dura,Gery Stafford,Leonid A Bendersky,Thomas P. Moffat
Amrit P. Kafle,Winnie Wong-Ng, Vladimir Oleshko,Gery R. Stafford,James A. Kaduk,Andreza Eufrasio,Ian L. Pegg,Biprodas Dutta
POWDER DIFFRACTION (2024)
Amrit P. Kafle,Winnie Wong-Ng, Vladimir Oleshko,Gery R. Stafford,James A. Kaduk,Andreza Eufrasio,Ian L. Pegg,Biprodas Dutta
Powder Diffractionpp.1-15, (2024)
ECS Meeting Abstractsno. 24 (2022): 998-998
ECS Meeting Abstractsno. 30 (2022): 1086-1086
ECS Meeting Abstractsno. 56 (2022): 2166-2166
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