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个人简介
Dr. Gaoliang Dai is currently a research scientist and the head of the working group “photomask Metrology” at the Physikalisch-Technische Bundesanstalt (PTB), Germany. His main areas of research have been the measurements of nano- and microscale structures by means of stylus profilometer, optical and AFM. He is responsible for developing the high accurate metrological AFM and metrological large range AFM at PTB, which serve as the main workhorses for versatile nanoscale dimensional calibration tasks, for instance, the calibrations of step height/depth setting, 1D/2D gratings, critical dimension (CD), line edge roughness (LER)/line width roughness (LWR) etc. Gaoliang gained a BSc and a PhD in optical engineering from the Tsinghua University, P. R. China, in the year of 1994 and 1998, respectively. He was a R&D engineer in the Physik Instrument (PI) GmbH & Co till the year 2001. He has authored over 80 technical publications in the field of micro- and nanometrology.
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Dorothee Hueser,Rudolf Meess,Gaoliang Dai, Andre Felgner,Kai Hahm, Stefan Verhuelsdonk, Carsten Feist,Sai Gao
SURFACE TOPOGRAPHY-METROLOGY AND PROPERTIESno. 1 (2024)
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY (2024): 118361
Nanomanufacturing and Metrologyno. 1 (2024): 1-10
Lectures (2023)
MEASUREMENT SCIENCE AND TECHNOLOGYno. 5 (2023): 055009-055009
Tm-technisches Messenno. s1 (2023): 27-32
arXiv (Cornell University) (2023)
Nanomanufacturing and Metrologyno. 4 (2022): 412-422
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