Fabio Quaranta

Fabio Quaranta was born in Bari, Italy. He received the Laurea degree in physics from the University of Bari Aldo Moro, Bari, Italy, in 1988. In 1994, he joined the Institute of Microelectronics and Microsystems, National Research Council (IMM-CNR), Lecce, Italy, becoming a permanent Staff Member, in 1998. He is currently in charge of the scientific activities and development of the Advanced Micro and Nanoelectronics Device Laboratory, IMM-CNR, and reference person for all the activities related to opto- and micro/nanoelectronics devices fabrication. He is Expert in many of the processes that can be performed in a clean room, related to micro-, nano-, and optoelectronics devices fabrication in III–V semiconductor technology and for microelectromechanical systems (MEMS): optical photolithography, plasma-enhanced chemical vapor deposition (PECVD) of silicon nitride and silicon oxide, reactive-ion etching, high-density plasma etching (ICP) with both chlorine and fluorine chemistry, and physical vapor depositions (sputtering and evaporation). He has authored more than 100 articles in peer-reviewed international scientific journals, two patents, and many international conference proceedings.