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Research Interests

Papers共 65 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Advanced EUV CAR small molecule compounds design and its impact to etch performance
Yinjie Cen,Jong Keun Park,Suzanne M. Coley, Benjamin D. Naab, Li Cui,Emad Aqad, Stefan Alexandrescu,Rochelle Rena, Sylvie Eckert,Jason Behnke,ChoongBong Lee,Karen E. Petrillo
Advances in Patterning Materials and Processes XLI (2024)
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Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist
Suzanne Coley,Jong Keun Park,Emad Aqad,Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin D. Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu,Rochelle Rena,Jason Behnke,
Advances in Patterning Materials and Processes XLI (2024)
Cited0Views0Bibtex
0
0
Identifying trends in photoresist polymer properties to improve line and space defects
Benjamin D. Rafael-Naab,Jong Keun Park,Emad Aqad,Yinjie Cen,Suzanne M. Coley, Li Cui, Conner Hoelzel,Choong Bong Lee,Jason Behnke,Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu,
Advances in Patterning Materials and Processes XLI (2024)
Cited0Views0Bibtex
0
0
Impact of increasing EUV absorption of CAR polymers on lithographic performance
Yinjie Cen,Emad Aqad, Li Cui,Suzanne M. Coley,Jong Keun Park, Benjamin D. Naab,Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Michael Finch,Jason Behnke,
Advances in Patterning Materials and Processes XLI (2024)
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0
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Disruptive non-fluorinated photoacid generators using computational chemistry and library design
Paul LaBeaume, Kenneth Hernandez, Edon Vitaku,Tomas Marangoni,Emad Aqad,Mingqi Li, Conner Hoelzel, Joseph Lachowski, Mark Hayes,Sabrina Wong, Jingyi Li,Amy Kwok,
Advances in Patterning Materials and Processes XLI (2024)
Cited0Views0Bibtex
0
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Spin speed impact on photoresist thin film properties and EUV lithographic performance
Yinjie Cen,ChoongBong Lee, Li Cui,Suzanne M. Coley,Jong Keun Park, Benjamin D. Naab-Rafael,Emad Aqad,Rochelle Rena, Tyler Paul, Tom Penniman,Jason Behnke, Julia T. Early,
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
Cited0Views0Bibtex
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Considerations in the design of photoacid generators
Conner Hoelzel, Li Cui, Benjamin D. Naab,Jong Park, Philjae Kang, Kenneth Hernandez,Suzanne M. Coley, Stefan Alexandrescu,Rochelle Rena,James Cameron,Emad Aqad
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
Cited0Views0Bibtex
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