基本信息
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个人简介
Ernest Y. Wu (M'90) received M.S. and Ph.D. degrees in physics from the University of Kansas, Lawrence, in 1986 and 1989, respectively.
In 1994, he joined the IBM Microelectronics Division, Essex Junction, VT, where he is currently a Senior Technical Staff Member with the Technology Reliability Department, Semiconductor Research and Development Center (SRDC), IBM System and Technology Group. He is responsible for technology qualification and development of dielectric reliability methodologies. He authored and coauthored more than 100 technical and conference papers with several invited papers and tutorials, as well as 11 IEEE International Electron Device Meeting (IEDM) papers. His research interests include reliability physics, device physics, and carrier transport phenomena.
Dr. Wu has served on the Device Dielectric Committee as the Chair and a Cochair for the 2007 and the 2005 International Reliability Physics Symposium (IRPS), respectively. He is a member of the CMOS and Interconnect Reliability committee of IEDM for 1999 and 2000.
研究兴趣
论文共 173 篇作者统计合作学者相似作者
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期刊级别
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IEEE International Reliability Physics Symposiumpp.1-9, (2024)
IEEE International Reliability Physics Symposiumpp.1-8, (2024)
IEEE International Reliability Physics Symposiumpp.2A.1-1-2A.1-6, (2024)
Advanced Electronic Materialsno. 10 (2023): n/a-n/a
Microelectronics Reliability (2023): 114982-114982
2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)
2023 IEEE International Reliability Physics Symposium (IRPS)pp.1-9, (2023)
IEEE International Reliability Physics Symposium (IRPS)pp.1-10, (2022)
2022 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)pp.1-5, (2022)
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作者统计
#Papers: 173
#Citation: 4235
H-Index: 33
G-Index: 60
Sociability: 6
Diversity: 1
Activity: 1
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