Altamirano-Sanchez, E. - Dept Unit Proc & Modules, IMEC

基本信息

Career Trajectory

Bio

Dr. Efraín ALTAMIRANO is a process engineer on the dry etch group at IMEC since 2006. IMEC is Europe's leading independent research center in the field of micro-and nanoelectronics, nanotechnology, enabling design methods and technologies for ICT systems. He holds a PhD from the Institute de Recherches sur la Catalyse (Lyon 1, France) and a MS and a BS in Chemical Engineering from the National University of Mexico (UNAM).

Research Interests

Papers共 89 篇Author StatisticsCo-AuthorSimilar Experts

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Wet Cleaning/Etching of NiAl Thin Film

Quoc Toan Le, Ersin Arslan, Kevin Fundu,Jean Philippe Soulie,Efraín Altamirano-Sánchez

Solid State Phenomena (2023): 341-345

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Study on Alternative Dipole Material Wet Clean by pH Controlled Functional Water

Yoïchi Tanaka, Nobuko Gan, Yuko Ogawa,Hideaki Iino, Ren Jie Chang, Suvidyakumar Homkar, Giuseppe Alessio Verni, M. E. Givens, Ju Geng Lai,Antoine Pacco,S. Brus,Hiroaki Arimura,

Solid State Phenomena (2023): 69-73

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A Cleaning Method for Post-Etch Ruthenium Residue Removal Using UV and Liquid Chemical

T. Nakano,Quoc Toan Le, Hikaru Kawarazaki, Takayoshi Tanaka,Efraín Altamirano-Sánchez

Solid State Phenomena (2023): 335-340

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Selectivity Tuning by Peroxide Concentration for the Selective Etching of SiGe20 to Si and SiGe40 to SiGe20

Francisco Javier López Villanueva,Farid Sebaai,Efraín Altamirano-Sánchez,Andreas Klipp

Solid State Phenomena (2023): 29-33

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Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution

Antoine Pacco,Teppei Nakano,Shota Iwahata, Akihisa Iwasaki,Efrain Altamirano Sanchez

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A（2023）

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Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing

Dong Gyu Kim,Guy Vereecke,Pallavi Puttarame Gowda,Kurt Wostyn,Tae-Gon Kim,Jin Goo Park,Efraín Altamirano-Sánchez

Solid State Phenomena (2023): 34-39

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Using water structuring by ions to address pattern loading in wet HF-based oxide recess etch

Guy Vereecke, Hanne De Coster, Denis Dochain, Kunsulu Nurekeyeva, Shona Conlan, Anthony Nsimba,Kurt Wostyn,Efrain Altamirano Sanchez

Microelectronic Engineering (2023): 112058

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SiGe Selective Etching to Enable Bottom and Middle Dielectric Isolations for Advanced Gate-All-Around FET Architecture

Hikaru Kawarazaki, T. Nakano, Takaaki Ishizu, Takayoshi Tanaka, Wen Li, Jason Chen, Tomoko Kawashima, Aibin Wu,Farid Sebaai, Ju Geng Lai,Oniki Yusuke,Efraín Altamirano-Sánchez

Solid State Phenomena (2023): 23-28

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Monitoring of Trace Molecular Impurities in Clean-Room Air

Karine Kenis,Paul Mertens,Efraín Altamirano-Sánchez, Joost Van Ongeval, M. De Vita

Solid State Phenomena (2023): 183-188

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Wet Cleaning of Molybdenum for Nano Interconnects

Quoc-Toan Le,Haci Guevenc,Ansar Ibrahim,Andreas Klipp,Stefan Decoster,Gayle Murdoch,Efrain Altamirano Sanchez

ECS Transactionsno. 4 (2022): 39-44

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