David Craig

David M. Craig received the A.S. degree from Quincy College, Quincy, MA, USA. He is currently an Assistant Staff Member of the Advanced Imager Technology Group, MIT Lincoln Laboratory, Lexington, MA, USA. In 1980, he joined the Submicrometer Technology Group where he designed software for a prototype 193-nm laser lithography stepper system, and participated in the fabrication of the first FET using 193-nm technology. He has worked on a variety of computer systems, and radio transmitters and communications systems. In 1995, he joined the Advanced Imaging Technology Group, designing software and test systems for orthogonal transfer CCD image sensors and APD sensors. His current work includes the design of electronic systems for novel image sensors and remote sensing applications.