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Research Interests

Papers共 48 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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Advanced Multi-Vt Enabled by Selective Layer Reductions for 2nm Nanosheet Technology and Beyond
R. Bao, Y. Oniki, X. He, Y. Isobe, P. Hundekar, S. Matsuyama,S. Mignot, S. Kawamoto, A. V. Ramirez, H. Abe, A. Chou, T. Hamada, W. Parkin,M. Sankarapandian,P. Jamison,A. Reznicek, S. Sudhindra, Y. Murakami, T. McDonough, S. Kumar, W. Zhao, H. Zhou, J. Li, G. Bajpai,E. Miller,I. Seshadri, L. Qin, C. Adams, M. Wang, Y. Zhu,B. Peethala,D. K. Sohn, M. Lagus, K. Zhao, R. Mo,E. Leobandung, K. Tomida,D. Guo, Y. Fukuzaki,H. Bu
2024 IEEE International Electron Devices Meeting (IEDM)pp.1-4, (2024)
Cited0Views0EIWOSBibtex
0
0
(Invited) Extending Advanced CMOS Scaling with SiGe Channel Materials
R. J. Carter,R. Sporer,T. J. McArdle,G. R. Mulfinger,J. R. Holt, S. Beasor, A. Child,J. Fronheiser,J. A. Wahl, H. Geisler, G. J. Kluth,D. H. Triyoso,K. Punchihewa, U. Rana,L. Vanamurthy,D. K. Sohn
SILICON COMPATIBLE MATERIALS, PROCESSES, AND TECHNOLOGIES FOR ADVANCED INTEGRATED CIRCUITS AND EMERGING APPLICATIONS 8no. 6 (2018): 3-10
Cited3Views0Bibtex
3
0
14Nm FinFET Technology SRAM Cell Margin Evaluation and Analysis by Local Layout Effect
S. Y. Mun,D. Burnett,K. Y. Lim,S. Parihar, Y. J. Shi,H. C. Lo,W. Hong, K. J. Lee,O. Hu,J. Versaggi, C. Jerome, J. G. Lee,S. B. Samavedam,D. K. Sohn
IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conferencepp.1-2, (2017)
Cited2Views0EIWOSBibtex
2
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A 7nm Cmos Technology Platform For Mobile And High Performance Compute Application
S. Narasimha,B. Jagannathan,A. Ogino,D. Jaeger,Brian J. Greene,C. Sheraw,K. Zhao, B. S. Haran,Unoh Kwon, A. K. M. Mahalingam,B. Kannan, B. Morganfeld,J. Dechene,C. Radens, A. Tessier,A. Hassan, H. Narisetty,I. Ahsan,M. Aminpur, C. An,M. Aquilino,A. Arya,Rod Augur, N. Baliga, R. Bhelkar,G. Biery,A. Blauberg, N. Borjemscaia,A. Bryant,L. Cao, V. Chauhan, M. Chen, L. Cheng, J. Choo,C. Christiansen,Tao Chu,B. Cohen, R. Coleman,D. Conklin, S. Crown, A. da Silva,D. Dechene, G. Derderian, S. Deshpande, G. Dilliway, K. Donegan,Manfred Eller, Y. Fan,Q. Fang, A. Gassaria,R. Gauthier,S. Ghosh, G. Gifford,T. Gordon,M. Gribelyuk, G. Han, J.H. Han, K. Han, M. Hasan,J. Higman,J. Holt, L. Hu, L. Huang,C. Huang,T. Hung,Y. Jin,J. Johnson, S. Johnson,V. Joshi,M. Joshi,P. Justison, S. Kalaga,T. Kim, W. Kim,R. Krishnan,B. Krishnan,K. Anil,M. Kumar, J. Lee,R. Lee,J. Lemon,S.L. Liew, P. Lindo,M. Lingalugari, M. Lipinski, P. Liu, Jinping Liu, S. Lucarini,W. Ma,E. Maciejewski, S. Madisetti, A. Malinowski,J. Mehta, C. Meng,S. Mitra, C. Montgomery,H. Nayfeh,T. Nigam,G. Northrop,K. Onishi, C. Ordonio,M. Ozbek,Rohit Pal,Sanjay Parihar,O. Patterson,E. Ramanathan,I. Ramirez,R. Ranjan, J. Sarad,V. Sardesai, S. Saudari, C. Schiller,Biswanath Senapati, C. Serrau, N. Shah,T. Shen,H. Sheng,J. Shepard, Y. Shi,M.C. Silvestre,D. Singh, Z. Song, J. Sporre,P. Srinivasan, Z. Sun,A. Sutton,R. Sweeney,K. Tabakman, M. Tan, X. Wang,E. Woodard, G. Xu, D. Xu, T. Xuan,Y. Yan, J. Yang,K.B. Yeap, M. Yu,A. Zainuddin, J. Zeng, K. Zhang, M. Zhao, Y. Zhong,Rick Carter,Chung-hsun Lin,Stephan Grunow,C. Child, M. Lagus,Robert Fox,E. Kaste, G. Gomba,Srikanth Samavedam,P. Agnello,D. K. Sohn
2017 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)（2017）
Cited55Views0EIWOSBibtex
55
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Author Statistics

#Papers: 48

#Citation: 612

H-Index: 14

G-Index: 23

Sociability: 6

Diversity: 3

Activity: 0

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