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个人简介
Chung-En Tsai received the B.S. degree in mechanical engineering from National Taiwan University, Taipei, Taiwan, in 2016, where he is currently pursuing the Ph.D. degree with the Graduate Institute of Electronics Engineering.
His current research interests include chemical vapor deposition, Si/SiGe/Ge/GeSn epitaxial growth, gate stack reliability, and strain/stress simulations.
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Yu-Rui Chen,Bo‐Wei Huang, Chih Ming Cheng,Wan-Hsuan Hsieh,Chung-En Tsai, Charng-Gan Tu,Yi-Chun Liu,Liu C
IEEE Transactions on Electron Devicesno. 7 (2022): 3611-3616
2022 INTERNATIONAL ELECTRON DEVICES MEETING, IEDMpp.20.3.1-20.3.4, (2022)
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)pp.1-2, (2022)
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) (2022)
ECS Meeting Abstractsno. 29 (2022): 1284-1284
2022 International Electron Devices Meeting (IEDM) (2022)
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