基本信息
浏览量:7

个人简介
暂无内容
研究兴趣
论文共 6 篇作者统计合作学者相似作者
按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Fabia Farlin Athena,Omobayode Fagbohungbe,Nanbo Gong,Malte J. Rasch, Jimmy Penaloza,Sooncheon Seo,Arthur Gasasira,Paul Solomon,Valeria Bragaglia,Steven Consiglio,Hisashi Higuchi,Chanro Park,Kevin Brew,Paul Jamison,Christopher Catano,Iqbal Saraf, Claire Silvestre, Xuefeng Liu, Babar Khan, Nikhil Jain,Steven Mcdermott, Rick Johnson,I. Estrada-Raygoza,Juntao Li,Tayfun Gokmen,Ning Li,Ruturaj Pujari,Fabio Carta,Hiroyuki Miyazoe,Martin M. Frank,Antonio La Porta,Devi Koty,Qingyun Yang,Robert D. Clark,Kandabara Tapily,Cory Wajda,Aelan Mosden, Jeff Shearer,Andrew Metz,Sean Teehan,Nicole Saulnier,Bert Offrein, Takaaki Tsunomura,Gert Leusink,Vijay Narayanan,Takashi Ando
FRONTIERS IN ELECTRONICS (2024)
Seiji Nagahara,Arnaud Dauendorffer, Xiang Liu,Tomoya Onitsuka,Hisashi Genjima,Noriaki Nagamine,Yuhei Kuwahara,Yuya Kamei,Shinichiro Kawakami,Makoto Muramatsu,Satoru Shimura,Kathleen Nafus,Noriaki Oikawa,Yannick Feurprier,Marc Demand,Sophie Thibaut,Alexandra Krawicz,Steven Grzeskowiak,Katie Lutker-Lee,Eric Liu,Christopher Catano, Joshua D. LaRose, Jeffrery C. Shearer,Lior Huli,Philippe Foubert,Danilo De Simone
International Conference on Extreme Ultraviolet Lithography 2022 (2022)
N. Gong,M. J. Rasch,S. -C. Seo,A. Gasasira,P. Solomon,V. Bragaglia,S. Consiglio, H. Higuchi, C. Park,K. Brew,P. Jamison,C. Catano,I. Saraf,F. F. Athena,C. Silvestre, X. Liu, B. Khan,N. Jain,S. Mcdermott,R. Johnson,I. Estrada-Raygoza, J. Li,T. Gokmen,N. Li,R. Pujari,F. Carta,H. Miyazoe,M. M. Frank, D. Koty, Q. Yang,R. Clark,K. Tapily,C. Wajda,A. Mosden, J. Shearer, A. Metz,S. Teehan,N. Saulnier,B. J. Offrein,T. Tsunomura,G. Leusink,V. Narayanan,T. Ando
Y. Kim,S-C Seo,S. Consiglio,P. Jamison, H. Higuchi,M. Rasch,E. Y. Wu,D. Kong,I Saraf,C. Catano,R. Muralidhar,S. Nguyen, S. DeVries,O. Van der Straten,M. Sankarapandian,R. N. Pujari,A. Gasasira, S. M. Mcdermott,H. Miyazoe, D. Koty, Q. Yang, H. Yan,R. Clark,K. Tapily,S. Engelmann, R. R. Robison,C. Wajda,A. Mosden,T. Tsunomura, R. Soave,N. Saulnier,W. Haensch,G. Leusink, P. Biolsi,V Narayanan,T. Ando
Advanced Etch Technology for Nanopatterning IX (2020)
作者统计
#Papers: 6
#Citation: 24
H-Index: 3
G-Index: 4
Sociability: 5
Diversity: 1
Activity: 1
合作学者
合作机构
D-Core
- 合作者
- 学生
- 导师
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果,我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问,可以通过电子邮件方式联系我们:report@aminer.cn