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个人简介
Christopher Olsen received the B.S. degree in materials engineering from the University of California (UC), Los Angeles, in 1991, and the M.S. and Ph.D. degrees in materials science and engineering from UC Berkeley in 1994 and 1998, respectively, with a focus on semiconductor epitaxy, characterization, and far-infrared detector fabrication.
He is a Senior Member of the Technical Staff with the FEP Group, Applied Materials, Santa, Clara, CA. He has been with Applied Materials since 2000. Prior to joining Applied Materials, he was a Senior Process Engineer with VLSI Technology, San Jose, CA, and focused on 0.15-$\mu\hbox{m}$ CMOS gate dielectric development as well as shallow-trench-isolation (STI) corner rounding techniques. He is a holder of patents on methodology for N% determination in oxynitrides and STI corner rounding techniques.
研究兴趣
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ACADIA 2014: DESIGN AGENCYpp.637-646, (2014)
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ECS Meeting Abstractsno. 14 (2006): 654-654
SOLID STATE TECHNOLOGYno. 7.0 (2006): 39-+
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作者统计
#Papers: 11
#Citation: 215
H-Index: 7
G-Index: 7
Sociability: 3
Diversity: 1
Activity: 0
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